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Pat Gelsinger, former Intel CEO, joins Playground Capital as a general partner to invest in semiconductor startups using light-based lithography to revive Moore's Law, discussing his shift to venture capital and the importance of deep tech.
ASML is shipping its new $400 million high-NA EUV lithography machine, which can pattern features as small as 8 nanometers, crucial for advancing Moore's Law and meeting AI industry demand for denser, more powerful chips.
LithoGRPO introduces a novel framework that combines flow matching with GRPO-based reinforcement learning for fast and high-quality inverse lithography mask optimization, achieving state-of-the-art performance while maintaining efficient generation.