StampFormer: A Physics-Guided Material-Geometry-Coupled Multimodal Model for Rapid Prediction of Physical Fields in Sheet Metal Stamping
Summary
StampFormer is a physics-guided deep learning framework that fuses geometry and material properties to predict FEA outcomes for sheet metal stamping in under a second, achieving high fidelity with less than 8.5% relative error.
Similar Articles
Predicting Steel Fatigue Life from Micrographs Using Physics-Informed Deep Learning
This paper introduces FatigueCV, a physics-informed deep learning framework that predicts steel fatigue life from optical micrographs in under 65ms, using a CNN with uncertainty estimation. Validation on synthetic micrographs shows strong performance (R²=0.93), though real-world validation is noted as future work.
Physics-Informed and Hybrid Machine Learning in Additive Manufacturing: Application to Fused Filament Fabrication
This paper investigates physics-informed and hybrid machine learning strategies to predict bond quality and porosity in fused filament fabrication, showing accurate models even with limited experimental data.
A better way to model the behavior of metal alloys
MIT researchers have developed a machine-learning-based approach to accurately model the behavior of metal alloys, regardless of chemical complexity, enabling faster and cheaper materials innovation.
Equipment-centric workpiece localization in near real-time using deep learning-based vision and event-driven finite state machines
This paper presents an equipment-centric framework that uses deep learning-based vision and event-driven finite state machines to localize workpieces in hot forging factories, achieving high detection accuracy and low latency in operational settings.
LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography
LithoDreamer is the first physics-informed World Model framework for computational lithography, modeling the multi-stage lithography process as a decision-driven system. It achieves state-of-the-art performance in forward evolution and inverse planning for semiconductor manufacturing.