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Top chipmakers like Intel, Samsung, and TSMC are adopting ASML's advanced EUV machines and standardizing on 12-inch photomasks to improve chip production efficiency, driven by AI demand and geopolitical competition.
Intel has begun shipping notebook processors with parts fabricated using ASML's High-NA EUV scanner, marking the first high-volume manufacturing use of this next-generation lithography tool for Intel 18A process.
Dutch Trade Minister Sjoerd Sjoerdsma visited Washington to lobby against the MATCH Act, which would ban sales of older-generation chipmaking equipment to China, threatening ASML's business.
This newsletter highlights ASML's $400 million chipmaking machine critical for AI-era chips and Anthropic's feud with the US government over export controls on its Mythos AI model.
ASML is shipping its new $400 million high-NA EUV lithography machine, which can pattern features as small as 8 nanometers, crucial for advancing Moore's Law and meeting AI industry demand for denser, more powerful chips.
US officials claim ASML's EUV lithography machine may have ended up in China, which would breach export controls; ASML denies this, stating no such machine is in China and that all units are tracked.
This article traces the history of Dutch computing from the first computer in 1952 to ASML, highlighting the role of people like Edsger Dijkstra and the connection between academic thinking and industrial making.