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Samsung Demonstrates 3D Stacked FETs with Triple Nanosheet Channels at 42nm

Hacker News Top · 2026-06-19 Cached

Samsung demonstrates the first 3D Stacked FETs with triple nanosheet channels at a 42nm gate pitch, presented at the 2026 VLSI Symposium, achieving a high review score and highlighting a new vertical transistor architecture for advanced logic scaling.

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